Journal of the European Optical Society - Rapid publications, Vol 11 (2016)
Polishing material removal correlation on PMMA – FEM simulation
Abstract
© The Authors. All rights reserved. [DOI: 10.2971/jeos.2016.16012]
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References
S. Hwa, and R. Miller, Chemical Mechanical Polishing in Silicon Processing (Academic Press, San Diego, 1999).
J. Bliedtner, G. Gräfe, and R. Hector, Optical Technology (McGrawHill, New York, 2011).
E. Brinksmeier, O. Riemer, and A. Gessenharter, â€Finishing of structured surfaces by abrasive polishing,†Precis. Eng. 30, 325–336 (2006).
R. Boerret, A. Kelm, H. Thiess, and V. Giggel, â€ASPHERO5 - simulation and analysis of the aspherical polishing process,†Key Eng. Mat. 364, 488–492 (2008).
M. Speich, W. Rimkus, R. Börret, and D. K. Harrison, â€Materialabtrag beim Polieren - Finite Elemente Simulation und Versuch,†in Proceedings to 11th LS-Dyna Forum (DYNAmore, Ulm, 2012).
F. W. Preston, â€The Theory and Design of Plate Glass Polishing Machines,†Journal of the society of glass technology (1927).
R. Boerret, J. Raab, and M. Speich, â€Mould production for polymer optics,†Proc. SPIE 9192, 91921L (2014).